The alternative solution to manual cleaning
Dry Laser Cleaning Solution for Semi-Conductor
Using the World’s First Short Pulse
Mid-IR Fiber Laser
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Using the World’s First Short Pulse (fs-ns) Mid-IR Fiber Laser
Eliminates grease particles and other residues generated during the manufacturing of microelectronic/optical circuits.
Grease removal
Isopropanol residue
Other particles
The alternative solution to manual cleaning
WHAT WE CAN DO
The alternative solution to manual cleaning
WHAT WE CAN DO
The alternative solution to manual cleaning
Eliminates dust particles and organic residues of different sizes during generated during the manufacturing of microelectronic/optical circuits.
Organic removal
Isopropanol residue
Dust particles
ABOUT US
Who is Femtum?
Femtum's mid-infrared laser technology addresses key bottlenecks in semiconductor manufacturing, enabling next-level precision and sustainability.
The company’s innovations align perfectly with industry megatrends, such as the rise of AI, 5G, and IoT, making it a game-changer in the multi billions dollars semiconductor market.
With its precision-driven solutions, Femtum has become a trailblazer in mid-infrared fiber laser technology that is transforming semiconductor manufacturing. In addition to decades of expertise, Femtum's vision for the future is to revolutionize how semiconductors are processed, enabling faster, cleaner, and more efficient manufacturing.
Investors from Canada, USA, Germany, Japan and Poland
Dry Laser Cleaning Solution for Semi-Conductor
Using the World’s First Short Pulse
Mid-IR Fiber Laser
High-precision laser cleaning powered by the only 3µm pulsed fiber lasers on the market
Advantages of our solutions
Discover all the specifications
Discover all the specifications
Also, these manual processes increase the risk of wafer breakage and result in efficiency losses.
Current cleaning methods, like ultrasonic baths and repeated validations, do not always remove all residues, which lead to QA inspection rejections.
Why our dry laser cleaning solution is better?
Benefits of our solutions
Advantages of our solutions
Why our dry laser cleaning solution is better?
Current cleaning methods, like ultrasonic baths and repeated validations, do not always remove all residues, which lead to QA inspection rejections.
Also, these manual processes increase the risk of wafer breakage and result in efficiency losses.
Benefits of our solutions
For more information on the application
For more information on the application